k8ÓéÀÖ

SPIE Advanced Lithography + Patterning 2025

February 23 – 27

San Jose, California 

k8ÓéÀÖ is proud to sponsor SPIE Advanced Lithography + Patterning 2025. Join us at our technical presentations to learn from our experts on the latest developments in advanced lithography and extreme ultraviolet (EUV) materials.

Monday, February 24

1:40 PM - 2:00 PM PST | Rachel Snyder | Paper 13428-5

Tuesday, February 25

10:30 AM - 10:50 AM PST | Benjamin Naab | Paper 13428-16

Wednesday, February 26

8:20 AM - 8:40 AM PST | Qiuzhe (Ben) Xie | Paper 13428-33
 

5:30 PM - 7:00 PM PST | Cong (Colin) Liu | Paper 13428-75
 

4:45 PM – 5:05 PM PST | Euijin Ko | Paper 13428-51
 

5:30 PM - 7:00 PM PST | Bong-Kyun Kang | Paper 13428-81

Thursday, February 27

9:10 AM – 9:30 AM PST | Emad Aqad | Paper 13428-56
 

10:20 AM – 10:40 AM PST | KwangMo Choi | Paper 13428-43

Poster Session: Wednesday, February 26 | 5:30 PM – 7:00 PM PT

Jingyi Li | Paper 13428-95
 

Paul LaBeaume | Paper 13428-70
 

Bong-Kyun Kang | Paper 13428-81
 

Vageesha Liyanam Gunawardana | Paper 13428-84
 

Yongqiang Zhang | Paper 13428-106
 

Kamal P. Pandey | Paper 13428-82

For more information and connect with k8ÓéÀÖ while at SPIE, please contact us here.

To learn more about the k8ÓéÀÖ lithography materials that support advanced patterning, read about our portfolio of advanced overcoats.

For more information about SPIE, please visit the 

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