k8ÓéÀÖ

Optivisionâ„¢ CMP Pads

Optivisionâ„¢ CMP Pads

The Optivisionâ„¢ pad series for chemical mechanical planarization (CMP) is k8ÓéÀÖ’s second generation soft pad that improves on the performance of Politexâ„¢ pads and is designed for improvements in cost of ownership.

 
 
 

Features & benefits

  • Available on multiple substrates
  • Improved lifetime compared to Politexâ„¢ pads
  • Improved removal rate and defectivity compared to Politexâ„¢ polishing pads
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    Technical Resources
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      Safety Data Sheets(All Languages)
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        Other CMP Applications

        Our CMP pads cover a wide range of applications and technology nodes. To further explore Dupont CMP pads, see our overview of the product families by application

         
         
         
         
         
         
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