The Optivisionâ„¢ Pro series of polishing pads for chemical mechanical planarization (CMP) is k8ÓéÀÖ’s third-generation soft pad manufactured on a new platform that facilitates advanced polishing and is designed for improvements in cost of ownership.
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Our CMP pads cover a wide range of applications and technology nodes. To further explore Dupont CMP pads, see our overview of the product families by application